Mr
Osaka university
Author in the following contributions
- XFEL sub-10 nm focusing with 10^22 W/cm^2 intensity: wavefront corrected mirror and focus characterization
- High-NA hard X-ray in-line holography with advanced KB optics based on Wolter type-III geometry
- Determination of astigmatism in XFEL sub-10 nm focusing system using speckle patterns from random nanoparticles
