Presentation materials
Extreme ultraviolet lithography (EUVL) is considered to be the future method of mass production of integrated circuits on chips. For long time, Free-Electron Lasers (FELs) have been proposed to accomplish the challenges of EUVL, i.e., a suitable power optical light source and the scanning speed of the wafer. According to this, we developed a two-steps EUVL experiment at FLASH using a...
For the past 10 years, wavefront sensing has been a crucial component of Free Electron Laser (FEL) facilities. Not only does it help evaluate the quality of the wavefront delivered on the sample and optimize optical systems, but it also opens the door to the new, intriguing field of source metrology. Because of the complexity of the emission process, important parameters such as the effective...
Proper in-situ fine-adjustment of the optical elements is crucial for an optimal performance of beam lines at synchrotron or free-electron laser facilities, considering that even slight misalignments of the grazing incidence mirrors can already deteriorate the focal spot. Real-time wavefront monitoring represents a valuable tool for reduction of these aberrations. In particular, wavefront...
The intense X-ray FEL beam delivered by European X-ray Free Electron Laser (EuXFEL) facility gives rise to strong challenges for the optics and their diagnostic. It is important to have an accurate knowledge of the single pulse X-ray wavefront, which affects focal plane intensity and profile, spot size, and spatial resolution, as well as centroid location within the focal plane. Wavefront...
Wavefront sensing is a powerful tool enabling a variety of applications ranging from characterization and alignment of passive or active optical systems to non-destructive testing and phase imaging. Indeed, in the recent past, high-resolution Hartmann sensors have facilitated translating the applications of wavefront sensing to the extreme ultraviolet and X-ray spectral range.
In this...
Over the last decade, X-ray speckle-based techniques have been extensively developed for advanced imaging and high precision metrology of X-ray optics. The speckle-based techniques have gained popularity due to their relatively simple experimental requirements and ease of use. At Diamond, we have worked extensively since 2012 to enhance the technique and to apply it to a range of X-ray imaging...
