Speaker
Giuliana Aquilanti
(Elettra - Sincrotrone Trieste)
Description
The u-XRF beamline is in the portfolio of beamlines of the 4th generation light source Elettra 2.0. In this contribution the general characteristics of u-XRF are described.
The beamline will operate in a large energy range between 2 and 17 keV. The in vacuum undulator source and the optical layout based on a double demagnification stage will feature a micrometric, high brilliant beam at the sample position. The keyword of the future studies at u-XRF is “heterogeneities” with a spatial resolution which is impossible to achieve today at Elettra.